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Original Essays | December 12, 2009

Alexander McCall Smith: IMG The Courage of Others

0 comments By Alexander McCall Smith

I have recently written a novel about life in England during the Second World War. I felt some concern before I tackled this theme — the War... Continue »
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    La's Orchestra Saves the World

    Alexander McCall Smith
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Advances in Low Temperature RF Plasmas: Basis for Process Design

Synopses & Reviews

Publisher Comments:

The work also covers some aspects of simulation and modeling aimed at higher density plasmas. All the chapters present a relatively complete review of the developments in these fields since the 1980s as well as a review of their status of development in 2002, and there is a blend of research reviews from both academia and industry.

Synopsis:

Low temperature plasmas have had a very broad range of applications ever since their discovery. Recent developments in the handling of dry etching non-equilibrium plasma have been the driving forces behind major developments in diagnostic, theoretical, and numerical techniques over the past two decades.

This book covers a range of issues which represent the basics of the complex, "vertically integrated" plasma simulation schemes including surface processes.

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Product Details

ISBN:
9780444510952
Subtitle:
Basis for Process Design
Author:
Makabe, T.
Publisher:
Libri
Location:
Amsterdam
Subject:
Physics
Subject:
Applied Sciences
Subject:
Industrial applications
Subject:
Low temperature plasmas.
Edition Number:
1st ed.
Edition Description:
Includes bibliographical references and indexes.
Series Volume:
01-63
Publication Date:
July 2002
Binding:
Hardcover
Language:
English
Illustrations:
Yes
Pages:
328
Dimensions:
10.56x7.68x.78 in. 2.21 lbs.
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