Like the bestselling original, this second edition of Microlithography is a self-contained text detailing both elementary and advanced aspects of submicron microlithography, offering a balanced treatment of theoretical and operating practices. Reflecting recently developed technologies, this edition includes coverage of immersion lithography, extreme ultraviolet (EUV) lithography, imprint lithography, photoresists for 193nm and immersion lithography, and scatterometry. The authors cover mechanical systems, optics, excimer laser light sources, and alignment techniques and analysis, as well as resist chemistry, processing, multilayer lithography, plasma and reactive ion etching, and metrology.

In recent decades, applications of microlithographic technology have led to advances in the development of semiconductor integrated circuits and microelectromechanical systems. This work is presented by Suzuki (project manager, Next Generation Lithography Tool Development, Nikon Corporation) and Smith (director, Center for Nanolithography Research, Rochester Institute of Technology) as both introduction to the science and technology of microlithography and as reference for more experienced readers seeking a wider knowledge and deeper understanding of the field. It covers system overview of optical steppers and scanners, optical lithography modeling, optics for photolithography, excimer laser for advanced microlithography, alignment and overlay, electron beam lithography systems, x-ray lithography, extreme ultraviolet lithography, and imprint lithography. It also offers coverage of resists and processing--in chapters discussing the chemistry of photoresist materials, resist processing, multiplayer resist technology, dry etching of photoresists--as well as treatment of critical dimensional metrology for integrated-circuit technology and electron beam nanolithography. The new edition has been updated in accord with advances in the field since the original 1998 edition. Annotation ©2007 Book News, Inc., Portland, OR (booknews.com)

This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts to advanced aspects of modern submicron microlithography. Each chapter reflects the current research and practices from the world's leading academic and industrial laboratories detailed by a stellar panel of international experts.

New in the Second Edition

In addition to updated information on existing material, this new edition features coverage of technologies developed over the last decade since the first edition appeared, including...

Immersion Lithography

157nm Lithography

Electron Projection Lithography (EPL)

Extreme Ultraviolet (EUV) Lithography

Imprint Lithography

Photoresists for 193nm and Immersion Lithography

Scatterometry

Microlithography: Science and Technology, Second Edition authoritatively covers the physics, chemistry, optics, metrology tools and techniques, resist processing and materials, and fabrication methods involved in the latest generations of microlithography such as immersion lithography and extreme ultraviolet (EUV) lithography. It also looks ahead to the possible future systems and technologies that will bring the next generations to fruition.

Loaded with illustrations, equations, tables, and time-saving references to the most current literature, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to achieve robust, accurate, and cost-effective microlithography processes and systems.