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Original Essays | April 11, 2014

Paul Laudiero: IMG Shit Rough Draft



I was sitting in a British and Irish romantic drama class my last semester in college when the idea for Shit Rough Drafts hit me. I was working... Continue »
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Thin Film Processes 2

Thin Film Processes 2 Cover

 

Synopses & Reviews

Publisher Comments:

This sequel to the 1978 classic, Thin Film Processes, gives a clear, practical exposition of important thin film deposition and etching processes that have not yet been adequately reviewed. It discusses selected processes in tutorial overviews with implementation guide lines and an introduction to the literature. Though edited to stand alone, when taken together, Thin Film Processes II and its predecessor present a thorough grounding in modern thin film techniques.

Key Features

* Provides an all-new sequel to the 1978 classic, Thin Film Processes

* Introduces new topics, and several key topics presented in the original volume are updated

* Emphasizes practical applications of major thin film deposition and etching processes

* Helps readers find the appropriate technology for a particular application

Table of Contents

J.L. Vossen and W. Kern, Introduction. S.M. Rossnagel, Glow Discharge Plasma and Sources for Etching and Deposition. C.V. Deshpandey and R.F. Bunshah, Evaporation Processes. P.P. Chow, Molecular Beam Epitaxy. R. Parsons, Sputter Deposition Processes. P.C. Johnson, The Cathodic Arc Plasma Deposition of Thin Films. K.F. Jensen and W. Kern, Thermal Chemical Vapor Deposition. K.F. Jensen and T. Kuech, Metal-Organic Chemical Vapor Deposition. J.G. Eden, Photochemical Vapor Deposition. L.C. Klein, Sol-Gel Coatings. R. Reif and W. Kern, Plasma-Enhanced Chemical Vapor Deposition. G. Lucovsky, D.V. Tsu, R.A. Rudder, and R.J. Markunas, Formation of Inorganic Films by Remote Plasma-Enhanced Chemical-Vapor Deposition. T.M. Mayer and S.D. Allen, Selected Area Processing. H.W. Lehman, Plasma-Assisted Etching. P.R. Puckett, S.L. Michel, and W.E. Hughes, Ion Beam Etching. C.I.H. Ashby, Laser-Driven Etching.

Product Details

ISBN:
9780127282510
Editor:
Vossen, John L.
Editor:
Kern, Werner
Author:
Vossen, Kern, Werner, John
Author:
Vossen, Kern, Werner, John L.
Publisher:
Academic Press
Location:
Boston :
Subject:
Physics
Subject:
Engineering - Electrical & Electronic
Subject:
Electronics - Semiconductors
Subject:
Thin films
Edition Description:
Includes bibliographical references and index.
Series Volume:
9287
Publication Date:
19910428
Binding:
Hardback
Language:
English
Illustrations:
Yes
Pages:
888
Dimensions:
9 x 6 in.

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Thin Film Processes 2
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