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Semiconductor Micromachining Volume 2

by

Semiconductor Micromachining Volume 2 Cover

 

Synopses & Reviews

Publisher Comments:

Semiconductor Micromachining - Fundamentals and Technology - is a two volume work in which, for the first time, the various disciplines associated with the theory and practice of device fabrication are brought together in one comprehensive reference source. Volume 1 contains a detailed coverage of semiconductor electrochemistry and physics whilst Volume 2 describes the wide range of microengineering technologies with details of practical applications. The authors for each chapter have been carefully selected for their expertise and are acknowledged leaders in their respective fields. The purpose of this book is to enable workers in the area of semiconductor micromachining to have ready access to the basic literature, essential to provide a solid basis for the many different aspects of physics, chemistry, electronics and engineering involved with this technology. The main focus of the book is on structures based on silicon, the most common and versatile of the current range of commercially available semiconductors, but other materials such as III-V semiconductors are also considered. Together these two volumes provide an indispensable reference text for this fast growing area of applied science. It will be of value to a wide range of academic and industrial scientists, technologists and engineers who wish to expand their knowledge in this area of science and for whom thus far, there has been no convenient reference work. Volume 1: Fundamental Electrochemistry and Physics

Synopsis:

A two-volume comprehensive guide to both the fundamental physics and chemistry of semiconductor processing, this text covers a broad range of topics ranging from chemical processes through to the microstructuring of semiconductors. Volume two concerns techniques and industrial applications.

Table of Contents

Volume 2

Anisotrophy and the Micromachining of Silicon
A. Campbell, et al.

Etch Stops
S. Collins

Photonic Integrated Circuits, Technology and Concepts
R. Matz

Monolithically Integrated Sensors for Mechanical Quantities in Standard CMOS Processing
H. Offereins, et al.

Silicon on Insulators
C. Harendt and G. Roos

Integrated Sensors and Actuators
N. Najaft

Smart Sensors
N. Najaft and J. Moyne

Anodic Oxidation of Silicon as a Low-Temperature Passivation Technique
G. Mende

Micromachined Optoelectronic Structures and Devices
P. Deimel

Wet and Dry Etching: A Comparison in the Context of Solid State Electronics Applications
K. Bachmann

Index

Product Details

ISBN:
9780471966821
Other:
Campbell, S. a.
Publisher:
John Wiley & Sons
Author:
Campbell, Cassandra
Author:
Campbell, Peter Judith Ed. Judith Ed.
Author:
Campbell, Peter Judith Ed. Judith Ed.
Author:
Lewerenz, H.
Author:
Campbell, S. a.
Author:
Lewerenz, H. J.
Author:
J
Author:
Campbell, Peter
Author:
Campbell, Dave
Author:
Lewerenz, H. L.
Subject:
Physics
Subject:
Electricity
Subject:
Electronics - Semiconductors
Subject:
Semiconductors
Subject:
Design and construction
Subject:
Semiconductors -- Design and construction.
Subject:
Microfabrication.
Subject:
Electricity-General Electronics
Subject:
Semiconductor physics
Copyright:
Edition Description:
Volume 2
Series:
Semiconductor Micromachining
Series Volume:
Volume 2
Publication Date:
June 1998
Binding:
HARDCOVER
Grade Level:
Professional and scholarly
Language:
English
Pages:
408
Dimensions:
238.5 x 157 x 27.2 mm 48 oz

Related Subjects

Science and Mathematics » Electricity » General Electricity
Science and Mathematics » Electricity » General Electronics
Science and Mathematics » Electricity » Solid State Electronics
Science and Mathematics » Materials Science » General
Science and Mathematics » Physics » General

Semiconductor Micromachining Volume 2 New Hardcover
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$444.50 In Stock
Product details 408 pages John Wiley & Sons - English 9780471966821 Reviews:
"Synopsis" by , A two-volume comprehensive guide to both the fundamental physics and chemistry of semiconductor processing, this text covers a broad range of topics ranging from chemical processes through to the microstructuring of semiconductors. Volume two concerns techniques and industrial applications.
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