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Other titles in the Materials Research Society Symposium Proceedings series:
Polycrystalline Thin Films - Structure, Texture, Properties & Applications III: Materials Research Society Symposium Proceedings, Vol. 472by Steven M. Yalisove
Synopses & Reviews
Thin films are used in virtually every manufacturing and technological area. A large fraction of these films are polycrystalline. Their uses range from critical components in the microelectronics industry, to hard coatings for wear resistance, corrosion resistance and thermal barriers, to magnetic, optical and medical applications. It is essential to the functional properties of these films that the microstructure, composition, architecture and stress state be produced with a high level of control which demands a detailed understanding of the mechanisms which are responsible for the formation of structure in polycrystalline thin films. This book focuses on thin polycrystalline metallic, ceramic and semiconducting films of thicknesses in the range of tens to thousands of nanometers. Topics range from fundamental to technological. Topics include: evolution of texture and microstructure; grain boundaries and interfaces; microstructure, stress and texture; characterization and representation; microstructure, texture and reliability; processing, characterization and application and polycrystalline Si and SiGe films.
Book News Annotation:
The 71 papers allow researchers in various fields to share ideas about the growth of thin films, their texture and structural evolution, phase transformation, characterizing grain boundaries and interfaces, stress analysis, and polycrystalline Si and SiGe films and devices. The specific topics include improving the long-term stability of polysilicon IC-resistors by fluorine doping, the heteroepitaxial growth of a cubic boron nitride single crystal on diamond seed under high pressure, mass transport paths in conventional and highly textured Al-Cu interconnect lines, the high-resolution X-ray reciprocal space mapping of wavy layers, the morphology and texture of chemical-vapor-deposited TiN films, and Read-Shockley boundaries.
Annotation c. Book News, Inc., Portland, OR (booknews.com)
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