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Other titles in the Materials Science and Process Technology series:

High Density Plasma Sources: Design, Physics, and Performance (Materials Science and Process Technology Series)

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High Density Plasma Sources: Design, Physics, and Performance (Materials Science and Process Technology Series) Cover

 

Synopses & Reviews

Publisher Comments:

This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications.

This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and practical applications. It should be of considerable interest to scientists and engineers working on plasma source design, and process development.

Synopsis:

This book presents a comprehensive description of the most promising high density plasma sources operated at low and intermediate pressures which are used, or could be used, in plasma processing such as etching and deposition. The authors are the leading experts in the field who are original inventors and designers of plasma sources they describe in this book. This book gives a balanced treatment of both the theoretical aspects and practical applications. It should be of considerable interest to scientists and engineers working on plasma source designs and process developments.

Synopsis:

This book describes the design, physics, and performance of high density (Ne>

About the Author

Oleg A. Popov is presently a research and development engineer at the Matsushita Electric Works, RandD Laboratory in Wobum, Massachusetts. After earning his doctorate in plasma physics from Moscow University, he worked on the physics of low pressure RF discharges. Since 1984 Dr. Popov has been involved in the design, studies and development of RF and microwave plasma sources used in plasma processing such as plasma and ion beam etching, PACVD, and ion implantation.

Table of Contents

1. Helicon Plasma Sources

Francis F. Chen

2. Planar Inductive Sources

John C. Forster and John H. Kel1er

3. Electrostatically-Shielded, Inductively-Coupled RF Plasma Sources

Wayne L. Johnson

4. Very High Frequency Capacitive Plasma Sources

Michael Colgen and Meyya Mayyappan

5. Surface Wave Plasma Sources

Michel Moisan, Joe/le Margot and Zenon Zakrzewski

6. Microwave Plasma Disk Reactor Processing

Machines Jes Asmussen

7. Electron Cyclotron Resonance Plasma Sources

James E. Stevens

8. Distributed ECR Plasma Sources

Jacques Pel1etier

Product Details

ISBN:
9780815513773
Editor:
Popov, Oleg A.
Author:
Poplov, Oleg A.
Editor:
Popov, Oleg A.
Author:
Popov, Oleg A.
Publisher:
William Andrew
Subject:
General
Subject:
Physics
Subject:
Engineering - Mechanical
Subject:
Chemistry - Physical & Theoretical
Subject:
High temperature plasmas.
Subject:
Plasma density.
Subject:
Mechanical
Subject:
Material Science
Subject:
Mechanical Engineering-General
Series:
Materials Science and Process Technology Series
Publication Date:
19970131
Binding:
HARDCOVER
Grade Level:
Professional and scholarly
Language:
English
Illustrations:
Y
Pages:
465
Dimensions:
9 x 6 in

Related Subjects

Engineering » Mechanical Engineering » General
Reference » Science Reference » Technology
Science and Mathematics » Electricity » General Electronics
Science and Mathematics » Materials Science » General
Science and Mathematics » Physics » General

High Density Plasma Sources: Design, Physics, and Performance (Materials Science and Process Technology Series) New Hardcover
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$221.75 In Stock
Product details 465 pages Noyes Data Corporation/Noyes Publications - English 9780815513773 Reviews:
"Synopsis" by , This book presents a comprehensive description of the most promising high density plasma sources operated at low and intermediate pressures which are used, or could be used, in plasma processing such as etching and deposition. The authors are the leading experts in the field who are original inventors and designers of plasma sources they describe in this book. This book gives a balanced treatment of both the theoretical aspects and practical applications. It should be of considerable interest to scientists and engineers working on plasma source designs and process developments.
"Synopsis" by , This book describes the design, physics, and performance of high density (Ne>
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