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Introduction To Microelectronic Fabrication 2ND Edition

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Introduction To Microelectronic Fabrication 2ND Edition Cover

ISBN13: 9780201444940
ISBN10: 0201444941
Condition:
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Synopses & Reviews

Publisher Comments:

Introduction to Microelectronic Fabrication, Second Edition, by Richard C. Jaeger, is a concise survey of the most up-to-date techniques in the field. It is devoted exclusively to processing and is highlighted by careful explanations, clean, simple language, and numerous fully solved example problems.

The second edition includes an entirely new chapter on MEMS, as well as substantial modifications to the chapters on MOS and bipolar process integration. Also included is new or expanded coverage of lithography and exposure systems, trench isolation, chemical mechanical polishing, shallow junctions, transient enhanced diffusion, copper Damascene processes and process simulation.

Synopsis:

This text is designed to introduce students to the fabrication of solid state devices and integrated circuits. The author's goal in writing this text was to present the basic information necessary to prepare the student for more advanced processing and design courses.

Synopsis:

This introductory book assumes minimal knowledge of the existence of integrated circuits and of the terminal behavior of electronic components such as resistors, diodes, and MOS and bipolar transistors. It presents to readers the basic information necessary for more advanced processing and design books. Focuses mainly on the basic processes used in fabrication, including lithography, oxidation, diffusion, ion implementation, and thin film deposition. Covers interconnection technology, packaging, and yield. Appropriate for readers interested in the area of fabrication of solid state devices and integrated circuits.

Table of Contents

(NOTE: Each chapter concludes with Summary, References, and Problems.)

Preface.

1. An Overview of Microelectronic Fabrication.

A Historical Perspective. An Overview of Monolithic Fabrication Processes and Structures. Metal-Oxide-Semiconductor (MOS) Processes. Basic Bipolar Processing. Safety.

2. Lithography.

The Photolithographic Process. Etching Techniques. Photomask Fabrication. Exposure Systems. Exposure Sources. Optical and Electron Microscopy. Further Reading.

3. Thermal Oxidation of Silicon.

The Oxidation Process. Modeling Oxidation. Factors Influencing Oxidation Rate. Dopant Redistribution During Oxidation. Masking Properties of Silicon Dioxide. Technology of Oxidation. Oxide Quality. Selective Oxidation and Shallow Trench Formation. Oxide Thickness Characterization. Process Simulation.

4. Diffusion.

The Diffusion Process. Mathematical Model for Diffusion. The Diffusion Coefficient. Successive Diffusions. Solid-Solubility Limits. Junction Formation and Characterization. Sheet Resistance. Generation-Depth and Impurity Profile Measurement. Diffusion Simulation. Diffusion Systems. Gettering.

5. Ion Implantation.

Implantation Technology. Mathematical Model for Ion Implantation. Selective Implantation. Junction Depth and Sheet Resistance. Channeling, Lattice Damage, and Annealing. Shallow Implantation. Source Listing

6. Film Deposition.

Evaporation. Sputtering. Chemical Vapor Deposition. Epitaxy. Further Reading.

7. Interconnections and Contacts.

Interconnections in Integrated Circuits. Metal Interconnections and Contact Technology. Diffused Interconnections. Polysilicon Interconnections and Buried Contacts. Silicides and Multilayer-Contact Technology. The Liftoff Process. Multilevel Metallization. Copper Interconnects and Damascene Processes. Further Reading.

8. Packaging and Yield.

Testing. Wafer Thinning and Die Separation. Die Attachment. Wire Bonding. Packages. Flip-Chip and Tape-Automated-Bonding Processes. Yield. Further Reading.

9. MOS Process Integration.

Basic MOS Device Considerations. MOS Transistor Layout and Design Rules. Complementary MOS (CMOS) Technology. Silicon on Insulator.

10. Bipolar Process Integration.

The Junction-Isolated Structure. Current Gain. Transit Time. Basewidth. Breakdown Voltages. Other Elements in SBC Technology. Layout Considerations. Advanced Bipolar Structures. Other Bipolar Isolation Techniques. BICMOS.

11. Processes for Microelectromechanical Systems—MEMS.

Mechanical Properties of Silicon. Bulk Micromachining. Silicon Etchants. Surface Micromachining. High-Aspect-Ratio Micromachining: The LIGA Molding Process. Silicon Wafer Bonding. IC Process Compatibility.

Answers to Selected Problems.

Index.

What Our Readers Are Saying

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Average customer rating based on 1 comment:

tofy, February 2, 2007 (view all comments by tofy)
this book is a very good reference for the bigenners in microelectronic fabrication process. but I think that there should be another book to be in more detail and concentrated on the fabrication process and showing the simulation processes for it.
Was this comment helpful? | Yes | No
(3 of 5 readers found this comment helpful)

Product Details

ISBN:
9780201444940
Author:
Jaeger, Richard C
Publisher:
Prentice Hall
Author:
Jaeger, Richard C.
Location:
Upper Saddle River, N.J.
Subject:
Electronics - General
Subject:
Logic Design
Subject:
Integrated circuits
Subject:
Design and construction
Subject:
Artificial Intelligence - Fuzzy Logic
Copyright:
Edition Number:
2
Edition Description:
Trade paper
Series Volume:
7
Publication Date:
October 2001
Binding:
TRADE PAPER
Grade Level:
College/higher education:
Language:
English
Illustrations:
Yes
Pages:
316
Dimensions:
9.2 x 7 x 1 in 526 gr

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Related Subjects

Computers and Internet » Artificial Intelligence » Fuzzy Logic
Reference » Science Reference » Technology
Science and Mathematics » Electricity » General Electronics
Science and Mathematics » Electricity » Solid State Electronics
Science and Mathematics » Materials Science » General

Introduction To Microelectronic Fabrication 2ND Edition New Trade Paper
0 stars - 0 reviews
$92.20 In Stock
Product details 316 pages Prentice Hall - English 9780201444940 Reviews:
"Synopsis" by , This text is designed to introduce students to the fabrication of solid state devices and integrated circuits. The author's goal in writing this text was to present the basic information necessary to prepare the student for more advanced processing and design courses.
"Synopsis" by , This introductory book assumes minimal knowledge of the existence of integrated circuits and of the terminal behavior of electronic components such as resistors, diodes, and MOS and bipolar transistors. It presents to readers the basic information necessary for more advanced processing and design books. Focuses mainly on the basic processes used in fabrication, including lithography, oxidation, diffusion, ion implementation, and thin film deposition. Covers interconnection technology, packaging, and yield. Appropriate for readers interested in the area of fabrication of solid state devices and integrated circuits.
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