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Physics of Submicron Lithographyby Kamil A. Valiev
Synopses & Reviews
This monograph details the physics behind the methods of generating submicron forms for electron beam, ion beam, optical, and X-ray lithography. Topics are discussed at the level of analytical theory, allowing a study of scientific issues in the field without frequent reference to a general physics text.
Book News Annotation:
A new stage in the development of microelectronics is connected with converting to devices of submicron size; processing materials into such small devices is possible with electron, ion, and x-ray lithographic methods--and this, according to Valiev (Academy of Sciences of the USSR), ". . . will unconditionally be the most important achievement in science and technology for the last quarter of the 20th century." The information presented here is for specialists in microelectronics who must equip, or reequip, themselves with knowledge of the physics of electron and ion beams and x-ray and ultraviolet radiation, including forming the beams and their interactions with matter.
Annotation c. Book News, Inc., Portland, OR (booknews.com)
Table of Contents
Forming Electron Beams of Submicron Cross Section. The Physics of the Interactions Between Fast Electrons and Matter. The Physics of Ion Beam Lithography. The Physics of X-Ray Microlithography. Optical Lithography. Proceedures for Processing Exposed Resist Films and Resist Mask Topography. Index.
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