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Plasma Processes for Semiconductor Fabrication

by

Plasma Processes for Semiconductor Fabrication Cover

 

Synopses & Reviews

Publisher Comments:

Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes, and shows how they can be accurately modeled. The author begins with an overview of plasma reactors and discusses the various models for understanding plasma processes. He then covers plasma chemistry, addressing the effects of different chemicals on the features being etched. Having presented the relevant background material, he then describes in detail the modeling of complex plasma systems, with reference to experimental results. The book closes with a useful glossary of technical terms. No prior knowledge of plasma physics is assumed in the book. It contains many homework exercises and serves as an ideal introduction to plasma processing and technology for graduate students of electrical engineering and materials science. It will also be a useful reference for practicing engineers in the semiconductor industry.

Synopsis:

Self-contained book providing an up-to-date description of plasma etching and deposition in semiconductor fabrication. Presents the basic physics and chemistry of these processes, and shows how they can be accurately modelled. Suitable as a graduate-level textbook, and will also be a useful reference for practising engineers in the semiconductor industry.

Synopsis:

An up-to-date description of plasma etching and deposition in semiconductor fabrication.

Table of Contents

1. Introduction; 2. Plasma processes and semiconductors; 3. Plasma electromagnetics and circuit models; 4. Plasma models; 5. Plasma chemistry; 6. Transport at long mean free path; 7. Evolution of the trench; 8. Physical description of the plasma; 9. Going further; 10. Glossary.

Product Details

ISBN:
9780521591751
Author:
Hitchon, W. Nicholas G.
Publisher:
Cambridge University Press
Author:
Hitchon, W. N. G.
Author:
Hitchon, W. Nicholas G.
Author:
Broers, Alec
Author:
Pepper, Michael
Author:
Ahmad, Haroon
Location:
Cambridge ;
Subject:
General
Subject:
Engineering - Electrical & Electronic
Subject:
Electronics - Semiconductors
Subject:
Semiconductors
Subject:
Etching
Subject:
Plasma etching.
Subject:
Engineering / Electrical
Subject:
Electricity-General Electronics
Series:
Cambridge Studies in Semiconductor Physics and Microelectronic Engineering
Series Volume:
08
Publication Date:
19990131
Binding:
Paperback
Grade Level:
Professional and scholarly
Language:
English
Illustrations:
31 line diagrams 2 tables 33 exercis
Pages:
232

Related Subjects

Computers and Internet » Computers Reference » General
Health and Self-Help » Health and Medicine » History of Medicine
Science and Mathematics » Biology » General
Science and Mathematics » Electricity » General Electricity
Science and Mathematics » Electricity » General Electronics
Science and Mathematics » Electricity » Solid State Electronics

Plasma Processes for Semiconductor Fabrication Used Hardcover
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Product details 232 pages Cambridge University Press - English 9780521591751 Reviews:
"Synopsis" by , Self-contained book providing an up-to-date description of plasma etching and deposition in semiconductor fabrication. Presents the basic physics and chemistry of these processes, and shows how they can be accurately modelled. Suitable as a graduate-level textbook, and will also be a useful reference for practising engineers in the semiconductor industry.
"Synopsis" by , An up-to-date description of plasma etching and deposition in semiconductor fabrication.
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