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Original Essays | September 4, 2014

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Thin Film Ferroelectric Materials & Devices

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Synopses & Reviews

Publisher Comments:

Thin Film Ferroelectric Materials and Devices is a compilation of current research and development in two very important ferroelectric device technologies, namely ferroelectrics for Dynamic Random Access Memories (DRAMs) and Non-Volatile Ferroelectric Random Access Memories (NV-FRAMs). Given the rapid pace of development and the broad scope of the general topic of ferroelectric materials, readers will benefit from such a focused presentation. The primary focus of Thin Film Ferroelectric Materials and Devices is to expound the materials and device aspects of these technologies. All the chapters have been written by leaders in their fields. Therefore, each chapter provides a comprehensive treatment of a specific topic of relevance to these two technologies. Thin Film Ferroelectric Materials and Devices will be of great value to materials and device scientists, device and process engineers, students, and postdoctoral associates. Furthermore, this compilation will serve as a concise introduction for new entrants to this exciting field.

Book News Annotation:

This compilation of nine papers on the burgeoning R & D in this field focuses on two breakthrough ferroelectric device technologies: ferroelectrics for Dynamic Random Access Memories (DRAM's) and Non-volatile Ferroelectric Random Access Memories (NV-DRAM's). In-depth treatment is provided of such aspects of thin film materials and devices as: elastic domains in ferroelectric epitaxial films, layered perovskite thin films and memory devices, chemical vapor deposition, and degradation mechanisms and reliability issues. For materials and device scientists and device and process engineers.
Annotation c. Book News, Inc., Portland, OR (booknews.com)

Table of Contents

Preface. 1. (Ba,Sr)TiO3 Thin Films for DRAM's; S. Summerfelt. 2. (Ba,Sr)TiO3 Films and Process Integration for DRAM Capacitor; N. Mikami. 3. Elastic Domains in Ferroelectric Epitaxial Films; A. Roytburd. 4. Study of Growth Processes in Ferroelectric Films and Layered Heterostructures via in situ, Real-Time Ion Beam Analysis; O. Auciello, et al. 5. Layered Perovskite Thin Films and Memory Devices; J.F. Scott. 6. Pb(Zr,Ti)O3 Based Thin Film Ferroelectric Nonvolatile Memories; B.A. Tuttle. 7. Chemical Vapor Deposition of Ferroelectric Thin Films; C.M. Foster. 8. Degradation Mechanisms and Reliability Issues for Ferroelectric Thin Films; D. Dimos, et al. 9. Low Voltage Performance in Lead Based Ferroelectric Thin Film Memory Elements with (La,Sr)CoO3 Electrodes; S. Aggarwal, et al. Index.

Product Details

ISBN:
9780792399933
Other:
Ramesh, R.
Publisher:
Springer
Editor:
Ramesh, R.
Author:
Ramesh, R.
Location:
Boston :
Subject:
Engineering - General
Subject:
Materials
Subject:
Computer Engineering
Subject:
Thin film devices
Subject:
Random access memory.
Subject:
Ferroelectric thin films.
Subject:
Thin film devices -- Materials.
Subject:
Engineering - Electrical & Electronic
Subject:
Electronics - Circuits - General
Subject:
Electricity
Subject:
Circuits and Systems
Subject:
Optical and Electronic Materials
Subject:
Electrical engineering
Subject:
Characterization and Evaluation of Materials
Subject:
Engineering-General Engineering
Copyright:
Edition Description:
Book
Series:
Electronic Materials: Science & Technology
Series Volume:
3
Publication Date:
19970930
Binding:
HARDCOVER
Language:
English
Illustrations:
Yes
Pages:
256
Dimensions:
235 x 155 mm 1220 gr

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