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Other titles in the Materials Science and Process Technology series:

Handbook of Ion Beam Processing Technology: Principles, Deposition, Film Modification & Synthesis

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Handbook of Ion Beam Processing Technology: Principles, Deposition, Film Modification & Synthesis Cover

 

Synopses & Reviews

Publisher Comments:

Deals with ion beam processing for basic sputter etching of samples, sputter deposition of thin films, the synthesis of material in thin film form, and the modification of the properties of thin films.

Book News Annotation:

Deals with ion beam processing for basic sputter etching of samples, sputter deposition of thin films, the synthesis of material in thin film form, and the modification of the properties of thin films.
Annotation c. Book News, Inc., Portland, OR (booknews.com)

Table of Contents

Perspective on Past, Present and Future Uses of Ion Beam Technology

Part I. Ion Beam Technology

Gridded Broad-beam Ion Sources

ECR Ion Sources

Hall Effect Ion Sources

Ionized Cluster Beam (ICB) Deposition and Epitaxy

Part II. Sputtering Phenomena

Quantitative Sputtering

Laser-induced Fluorescence as a Tool for the Study of Ion Beam Sputtering

Characterization of Atoms Desorbed from Surfaces by Ion Bombardment Using Multiphoton Ionization Detection

Part III. Film Modification and Synthesis

The Modification of Films by Ion Bombardment

Control of Film Properties by Ion-assisted Deposition Using Broad Beam Sources

Etching with Directed Beams

Film Growth Modification by Concurrent Ion Bombardment: Theory and Simulation

Interface Structure and Thin Film Adhesion

Modification of Thin Films by Off-normal Incidence Ion Bombardment

Ion Beam Interactions with Polymer Surfaces

Topography: Texturing Effects

Methods and Techniques of Ion Beam Processes

Ion-assisted Dielectric and Optical Coatings

Diamond and Diamond-like Thin Films by Ion Beam Techniques

Index

Product Details

ISBN:
9780815511991
Other:
Cuomo, J. J.
Publisher:
William Andrew
Author:
Rossnagel, Stephen M.
Author:
Harold R. Kaufman
Author:
Cuomo, Jerome J.
Location:
Park Ridge, N.J., U.S.A. :
Subject:
Physics
Subject:
Electronics - General
Subject:
Ion bombardment
Subject:
Ion implantation.
Subject:
Ion bombardment -- Industrial applications.
Subject:
Material Science
Subject:
Physics-General
Edition Description:
Includes bibliographies and index.
Series:
Materials Science and Process Technology
Publication Date:
19900131
Binding:
HARDCOVER
Language:
English
Illustrations:
Yes
Pages:
456
Dimensions:
9 x 6 in

Related Subjects


Reference » General
Reference » Science Reference » Technology
Science and Mathematics » Electricity » General Electronics
Science and Mathematics » Environmental Studies » General
Science and Mathematics » Materials Science » General
Science and Mathematics » Physics » General

Handbook of Ion Beam Processing Technology: Principles, Deposition, Film Modification & Synthesis New Hardcover
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Product details 456 pages Noyes Data Corporation/Noyes Publications - English 9780815511991 Reviews:
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