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Lin Enger: IMG Knowing vs. Knowing



On a hot July evening years ago, my Toyota Tercel overheated on a flat stretch of highway north of Cedar Rapids, Iowa. A steam geyser shot up from... Continue »
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    Lin Enger 9781616203757

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Other titles in the Materials Science and Process Technology series:

Handbook of Plasma Processing Technology: Fundamentals, Etching, Deposition, and Surface Interactions (Materials Science and Process Technology Series)

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Handbook of Plasma Processing Technology: Fundamentals, Etching, Deposition, and Surface Interactions (Materials Science and Process Technology Series) Cover

 

Synopses & Reviews

Publisher Comments:

This is a comprehensive overview of the technology of plasma-based processing, written by an outstanding group of 29 contributors.

Book News Annotation:

Plasma processing currently provides the most practical way to carry out many of the process steps involved in integrated circuitry. This overviews of the technology describes the advantages provided by plasmas, plasma fundamentals, and a range of plasma processes relevant to the deposition and etching of thin films for microelectronics and other fields.
Annotation c. Book News, Inc., Portland, OR (booknews.com)

Table of Contents

Techniques for IC Processing

Introduction to Plasma Concepts and Discharge Configurations

Fundamentals of Sputtering and Reflection

Bombardment-Induced Compositional Changes with Alloys, Oxides, Oxysalts, and Halides

RF Diode Sputter Etching and Deposition

Magnetron Plasma Deposition Processes

Broad-Beam Ion Source

Reactive Ion Etching

Reactive Sputter Deposition

Plasma Enhanced Chemical Vapor Deposition of Thin Films for Microelectronics

Electron Cyclotron Resonance Microwave Discharges for Etching and Thin Film Deposition

Hollow Cathode Etching and Deposition

Ion Plating

Ionized Cluster Beam (ICB) Deposition Techniques

The Activated Reactive Evaporation (ARE) Process

Formation of Thim Films by Remote Plasma Enhanced Chemical Vapor Deposition (Remote PECVD)

Selective Bias Sputter Deposition

Vacuum Arc-Based Processing

Ion Source Interactions: General Understandings

Ion Assisted Deposition

Microstructural Control of Plasma-Sputtered Refractory Coatings

Product Details

ISBN:
9780815512202
Other:
Cuomo, Jerome J.
Author:
Westwood, William D.
Author:
Cuomo, Jerome J.
Author:
Rossnagel, Stephen M.
Publisher:
William Andrew
Location:
Park Ridge, N.J., U.S.A. :
Subject:
Physics
Subject:
Engineering - Mechanical
Subject:
Electronics - Semiconductors
Subject:
Semiconductors
Subject:
Etching
Subject:
Plasma etching.
Subject:
Plasma engineering.
Subject:
Mechanical
Subject:
Material Science
Subject:
Mechanical Engineering-General
Copyright:
Edition Description:
Includes bibliographical references.
Series:
Materials Science and Process Technology Series
Series Volume:
21
Publication Date:
19910131
Binding:
HARDCOVER
Language:
English
Illustrations:
Yes
Pages:
546
Dimensions:
9 x 6 in

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Related Subjects

Engineering » Mechanical Engineering » General
Reference » General
Reference » Science Reference » Technology
Science and Mathematics » Biology » Primatology
Science and Mathematics » Chemistry » Chemical Engineering
Science and Mathematics » Electricity » General Electronics
Science and Mathematics » Materials Science » General
Science and Mathematics » Physics » General

Handbook of Plasma Processing Technology: Fundamentals, Etching, Deposition, and Surface Interactions (Materials Science and Process Technology Series) Used Hardcover
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