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Other titles in the Materials Science and Process Technology series:

Handbook of VLSI Microlithography: Principles, Technology and Applications (Materials Science and Process Technology Series)

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Handbook of VLSI Microlithography: Principles, Technology and Applications (Materials Science and Process Technology Series) Cover

 

Synopses & Reviews

Publisher Comments:

This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings-- including optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry.

The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely covered — including an entire chapter on resist process defectivity and the potential yield limiting effect on device production.

Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.

Book News Annotation:

Covers optical lithography, electron-beam, ion-beam, and x-ray lithography as applied to the manufacture of both routine and research level VLSI devices. Microlithography is the "driver technology" for Dynamic Random Access Memory (DRAM) manufacturing technology, because it determines circuit packing density, which in turn determines memory size or capacity and memory speed.
Annotation c. Book News, Inc., Portland, OR (booknews.com)

Synopsis:

Second Edition - Principles, Technology and Applications. This handbook presents the principles, technology and applications of VLSI microlithography. It covers optical lithography, electron beam, ion beam and X-ray lithography as it applied to the manufacture of both routine and research level VLSI devices. Contents include: Issues & Trends Affecting Lithography and tool Selection Strategy Resist Technology Design, Processing & Application Lithography Process Monitoring Techniques & Tools for Photo Metrology Techniques & Tools for Optical Lithography Microlithography Tool Automation Electron Beam ULSI Applications Rational Vibration and Structural Dynamics for Lithographic Tool Installation Application of Ion Beam Lithography & Direct Processing X-Ray Lithography.

Synopsis:

This handbook presents the principles, technology and applications of VLSI microlithography. It covers optical lithography, electron-beam, ion-beam, and X-ray lithography as applied to the manufacture of routine and research level VLSI devices. The book provides a more complete view of lithographic tool methods than has been presented previously.

About the Author

John Helbert is a Senior Member of the Motorola Technical Staff. He earned his doctorate in Physical

Motorola, USA

Table of Contents

Issues and Trends Affecting Lithography Tool Selection Strategy

Resist Technology ù Design, Processing, and Applications

Lithography Process Monitoring and Defect Detection

Techniques and Tools for Photo Metrology

Techniques and Tools for Optical Lithography

Microlithography Tool Automation

Electron-Beam ULSI Applications

Rational Vibration and Structural Dynamics for Lithographic Tool Installations

Applications of Ion Microbeams Lithography and Direct Processing

X-Ray Lithography

Part I

Part II

Acknowledgment

References

Index

Product Details

ISBN:
9780815512813
Editor:
Glendinning, William B.
Editor:
Helbert, John N.
Editor:
Glendinning, William B.
Editor:
Helbert, John N.
Author:
Glendinning, William B.
Author:
Helbert, John N.
Publisher:
William Andrew
Location:
Park Ridge, N.J., U.S.A. :
Subject:
Electronics - Circuits - Printed
Subject:
Integrated circuits
Subject:
Very large scale integration
Subject:
Microlithography
Subject:
Electronics - Circuits - General
Subject:
Electronics - Circuits - VLSI
Subject:
Electricity-General Electronics
Edition Description:
Includes bibliographical references and index.
Series:
Materials Science and Process Technology Series
Series Volume:
9284
Publication Date:
19910131
Binding:
HARDCOVER
Language:
English
Illustrations:
Yes
Pages:
671
Dimensions:
9.32x6.30x1.47 in. 2.27 lbs.

Related Subjects

Engineering » Construction » General
Science and Mathematics » Electricity » General Electronics
Science and Mathematics » Materials Science » General

Handbook of VLSI Microlithography: Principles, Technology and Applications (Materials Science and Process Technology Series) New Hardcover
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$183.50 In Stock
Product details 671 pages Noyes Data Corporation/Noyes Publications - English 9780815512813 Reviews:
"Synopsis" by , Second Edition - Principles, Technology and Applications. This handbook presents the principles, technology and applications of VLSI microlithography. It covers optical lithography, electron beam, ion beam and X-ray lithography as it applied to the manufacture of both routine and research level VLSI devices. Contents include: Issues & Trends Affecting Lithography and tool Selection Strategy Resist Technology Design, Processing & Application Lithography Process Monitoring Techniques & Tools for Photo Metrology Techniques & Tools for Optical Lithography Microlithography Tool Automation Electron Beam ULSI Applications Rational Vibration and Structural Dynamics for Lithographic Tool Installation Application of Ion Beam Lithography & Direct Processing X-Ray Lithography.
"Synopsis" by , This handbook presents the principles, technology and applications of VLSI microlithography. It covers optical lithography, electron-beam, ion-beam, and X-ray lithography as applied to the manufacture of routine and research level VLSI devices. The book provides a more complete view of lithographic tool methods than has been presented previously.
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