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Focused Ion Beam Systems

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Focused Ion Beam Systems Cover

 

Synopses & Reviews

Publisher Comments:

The focused ion beam (FIB) system is an important tool for understanding and manipulating the structure of materials at the nanoscale. Combining this system with an electron beam creates a DualBeam - a single system that can function as an imaging, analytical and sample modification tool. Presenting the principles, capabilities, challenges and applications of the FIB technique, this edited volume comprehensively covers the ion beam technology including the DualBeam. The basic principles of ion beam and two-beam systems, their interaction with materials, etching and deposition are all covered, as well as in situ materials characterization, sample preparation, three-dimensional reconstruction and applications in biomaterials and nanotechnology. With nanostructured materials becoming increasingly important in micromechanical, electronic and magnetic devices, this self-contained review of the range of ion beam methods, their advantages, and when best to implement them is a valuable resource for researchers in materials science, electrical engineering and nanotechnology.

Synopsis:

This edited volume comprehensively covers the focused ion beam and two beam technology.

Table of Contents

List of contributors; Preface; 1. Introduction to the focused ion beam system Nan Yao; 2. Interaction of ions with matter Nobutsugu Imanishi; 3. Gas assisted ion beam etching and deposition Hyoung Ho (Chris) Kang, Clive Chandler, and Matthew Weschler; 4. Imagining using electrons and ion beams Kaoru Ohya and Tohru Ishitani; 5. Characterization methods using FIB/SEM DualBeam instrumentation Steve Rentjens and Lucille A. Giannuzzi; 6. High-density FIB-SEM 3D nanotomography: with applications of real-time imaging during FIB milling E. L. Principe; 7. Fabrication of nanoscale structures using ion beams Ampere A. Tseng; 8. Preparation for physico-chemical analysis Richard Langford; 9. In-situ sample manipulation and imaging T. Kamino, T. Yaguchi, T. Ohnishi and T. Ishitani; 10. Micro-machining and mask repair Mark Utlaut; 11. Three-dimensional visualization of nanostructured materials using focused ion beam tomography Derren Dunn, Alan J. Kubis, and Robert Hull; 12. Ion beam implantation of surface layers Daniel Recht and Nan Yao; 13. Applications for biological materials Kirk Hou and Nan Yao; 14. Focused ion beam systems as a multifunctional tool for nanotechnology Toshiaki Fujii, Tatsuya Asahata, and Takashi Kaito; Index.

Product Details

ISBN:
9780521158596
Author:
Yao, Nan
Publisher:
Cambridge University Press
Location:
Cambridge
Subject:
Material Science
Subject:
Materials Science-General
Edition Description:
Trade paper
Publication Date:
20110431
Binding:
TRADE PAPER
Language:
English
Pages:
408
Dimensions:
9.61 x 6.69 x 0.83 in 1.43 lb

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Related Subjects


Reference » Science Reference » Technology
Science and Mathematics » Electricity » General Electronics
Science and Mathematics » Materials Science » General

Focused Ion Beam Systems New Trade Paper
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Product details 408 pages Cambridge University Press - English 9780521158596 Reviews:
"Synopsis" by , This edited volume comprehensively covers the focused ion beam and two beam technology.
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