Table of Contents
Preface.
1. Introduction: History and Perspectives of Rapid Thermal Processing;
F. Roozeboom. 2. The Thermal Radiative Properties of Semiconductors;
P.J. Timans. 3. Wafer Temperature Measurement in RTP;
C. Schietinger. 4. Wafer Emissivity in RTP;
C. Schietinger. 5. Temperature and Process Control in Rapid Thermal Processing;
J.-M. Dilhac. 6. Single-Wafer Process Integration and Process Control Techniques;
M.M. Moslehi, et al. 7. Rapid Thermal O
2-Oxidation and N
2-Oxynitridation;
M.L. Green. 8. Integrated Pre-Gate Dielectric Cleaning and Surface Preparation;
Y. Ma, M.L. Green. 9. Dielectric Photoformation on Si and SiGe;
I.W. Boyd. 10. Modeling Strategies for Rapid Thermal Processing: Finite Element and Monte Carlo Methods;
K.F Jensen, et al. 11. Modeling Approaches for Rapid Thermal Chemical Vapor Deposition: Combining Transport Phenomena with Chemical Kinetics;
K.F. Jensen, et al. 12. Silicidation and Metallization Issues Using Rapid Thermal Processing;
K. Maex. 13. Rapid Thermal Multiprocessing for a Programmable Factory for Manufacturing of ICs;
K.C. Saraswat. 14. RTCVD Integrated Processing for Photovoltaic Application;
E. Conrad, et al. 15. Equipment Design, Cluster Tools and Scale-up Issues;
L. Deutschmann, et al. 16. Rapid Thermal Chemical Vapour Deposition of Epitaxial Si and SiGe: Low Temperature Epitaxy in Production;
W.B. de Boer. 17. The Evolving Role of Rapid Thermal Processing for Deep Submicron Devices;
B. Lojek. 18. Rapid Thermal Processing of Contacts and Buffer Layers for Compound Semiconductor Device Technology;
A. Christou, et al. 19. Rapid Thermal Processing of Magnetic Thin Films for Data Storage Devices;
F. Roozeboom. Appendix. Subject Index.