Synopses & Reviews
This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications.
This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and practical applications. It should be of considerable interest to scientists and engineers working on plasma source design, and process development.
This book describes the design, physics, and performance of high density (Ne>
This book presents a comprehensive description of the most promising high density plasma sources operated at low and intermediate pressures which are used, or could be used, in plasma processing such as etching and deposition. The authors are the leading experts in the field who are original inventors and designers of plasma sources they describe in this book. This book gives a balanced treatment of both the theoretical aspects and practical applications. It should be of considerable interest to scientists and engineers working on plasma source designs and process developments.
About the Author
Oleg A. Popov is presently a research and development engineer at the Matsushita Electric Works, RandD Laboratory in Wobum, Massachusetts. After earning his doctorate in plasma physics from Moscow University, he worked on the physics of low pressure RF discharges. Since 1984 Dr. Popov has been involved in the design, studies and development of RF and microwave plasma sources used in plasma processing such as plasma and ion beam etching, PACVD, and ion implantation.
Table of Contents
1. Helicon Plasma Sources
Francis F. Chen
2. Planar Inductive Sources
John C. Forster and John H. Kel1er
3. Electrostatically-Shielded, Inductively-Coupled RF Plasma Sources
Wayne L. Johnson
4. Very High Frequency Capacitive Plasma Sources
Michael Colgen and Meyya Mayyappan
5. Surface Wave Plasma Sources
Michel Moisan, Joe/le Margot and Zenon Zakrzewski
6. Microwave Plasma Disk Reactor Processing
Machines Jes Asmussen
7. Electron Cyclotron Resonance Plasma Sources
James E. Stevens
8. Distributed ECR Plasma Sources