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Every December, when the Portland sun disappears, my mental health depends on a steady stream of sugary-sweet holiday rom-coms. While I love the low-budget movies (unlicensed new pop songs with auto-tuned jingle bells! Every scene obviously filmed in the same McMansion, even the ones that take place at "work"! Chemistry...
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Ion Implantation in Diamond, Graphite and Related Materials

by M. S. Dresselhaus and R. Kalish
Ion Implantation in Diamond, Graphite and Related Materials

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ISBN13: 9783642771736
ISBN10: 3642771734



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Synopses & Reviews

Publisher Comments

This book comprehensively reviews the current status of research involving ion implantation of diamond, graphite and related carbon-based materials. The major part of the discussion is devoted to diamond and graphite, since these have been most extensively studied. For background, a short tutorial presentation is given on the structure and properties of these materials prior to ion implantation. Also descibed is recent work on ion-implantaion effects in novel, related materials such as diamond-like (amorphous hydrogenated carbon) films, diamond films, glassy carbon, carbon fibers, and disordered carbons. Emphasis is given to the structural modifications that the implantation process induces in the various materials and how these modifications are reflected in their electrical, optical and mechanical properties. This volume will be of interest to researchers dealing with future electronic devices, machining tools, and fusion reactor materials and to those working in the gem-stone and cutting-tool industries.

Synopsis

Carbon has always been a unique and intriguing material from a funda mental standpoint and, at the same time, a material with many technological uses. Carbon-based materials, diamond, graphite and their many deriva tives, have attracted much attention in recent years for many reasons. Ion implantation, which has proven to be most useful in modifying the near surface properties of many kinds of materials, in particular semiconductors, has also been applied to carbon-based materials. This has yielded, mainly in the last decade, many scientifically interesting and technologically impor tant results. Reports on these studies have been published in a wide variety of journals and topical conferences, which often have little disciplinary overlap, and which often address very different audiences. The need for a review to cover in an integrated way the various diverse aspects of the field has become increasingly obvious. Such a review should allow the reader to get an overview of the research that has been done thus far, to gain an ap preciation of the common features in the response of the various carbon to ion impact, and to become aware of current research oppor allotropes tunities and unresolved questions waiting to be addressed. Realizing this, and having ourselves both contributed to the field, we decided to write a review paper summarizing the experimental and theoretical status of ion implantation into diamond, graphite and related materials."

Synopsis

This book compares the response to ion implantation of different carbon-based materials, emphasizing the structural modifications induced in the various systems and how these modifications are reflected in the electrical, optical and mechanical properties. This comprehensive review will be of interest to materials scientists dealing with future electronic devices, machining tools, and fusion reactor materials.

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Product Details

ISBN:
9783642771736
Binding:
Trade Paperback
Publication date:
01/25/2012
Publisher:
Springer
Series info:
Springer Series in Materials Science
Language:
English
Pages:
202
Height:
.46IN
Width:
6.14IN
Series:
Springer Series in Materials Science
Series Number:
22
Copyright Year:
1992
Series Volume:
22
Author:
R. Kalish
Author:
M. S. Dresselhaus
Author:
Rafael Kalish
Subject:
Materials Science-General
Subject:
Characterization and Evaluation of Materials
Subject:
Carbon
Subject:
Diamond
Subject:
Graphite.
Subject:
Ion implantation.
Subject:
Condensed matter physics
Subject:
annealing

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