Synopses & Reviews
Focuses on ion implantation as a new means of altering the properties of materials, with an emphasis on the doping of semiconductors through ion implantation. Discusses the problems that occur in a variety of applications, including the electrical activation of implanted ions, diffusion effects, the most common measurement methods for examining implanted layers, and requirements for accelerator equipment.
Table of Contents
Theoretical Background of Ion Implantation.
Problems of Implantation into Real Solids.
Ion Implantation Machines.
Measurement Techniques to Investigate Ion-Implanted Layers.
Properties of Ion-Implanted Semiconductor Layers.
Devices.
Implantation into Non-Semiconductors.
Appendix.
References.
Index.