Synopses & Reviews
This book provides an overview of the phenomenology, technology and application of secondary ion mass spectrometry as a technique for materials analysis. This approach is developing into one of the most effective methods of characterizing the composition and chemical state of the surface and sub-surface layers of solid materials. The first three chapters introduce the basic physical and chemical principles involved and the theories which have been proposed to explain the process. Subsequent chapters describe the instrumental components of the SIMS apparatus, the use of SIMS as an analytical tool, and the development of the techniques of sputtered neutral mass spectrometry and laser microprobe and plasma desorption mass spectrometry. Many practical examples are featured to illustrate the application of SIMS to real problems, possible pitfalls are pointed out, and data of use to analysts are collected in appendices. The book is a practical guide suitable for scientists in all fields who wish to use this valuable analytical technique.
Table of Contents
1. Introduction Secondary Ion Mass Spectrometry
2. The SIMS Phenomenon--The Experimental Parameters
3. SIMS--The Theoretical Models
4. SIMS Instrumentation
5. SIMS Depth Profiling of Semiconductors
6. The Application of Static SIMS in Surface Science
7. Static SIMS for Applied Surface Analysis
8. SIMS Imaging
9. SIMS-Related Techniques